On-chip focusing of plasmons in graded-index lenses is important for imaging, lithography, signal processing, and optical interconnects at the deep subwavelength nanoscale. However, owing to the inherent strong wavelength dispersion of plasmonic materials, the on-chip focusing of plasmons suffers from severe chromatic aberrations. With the well-established planar dielectric grating, a graded-index waveguide array lens (GIWAL) is proposed to support the excitation and propagation of acoustic graphene plasmon polaritons (AGPPs) and to achieve the achromatic on-chip focusing of the AGPPs with a focus as small as about 2% of the operating wavelength in the frequency band from 10 to 20 THz, benefiting from the wavelength-independent index profile of the GIWAL. An analytical theory is provided to understand the on-chip focusing of the AGPPs and other beam evolution behaviors, such as self-focusing, self-collimation, and pendulum effects of Gaussian beams as well as spatial inversions of digital optical signals. Furthermore, the possibility of the GIWAL to invert spatially broadband digital optical signals is demonstrated, indicating the potential value of the GIWAL in broadband digital communication and signal processing.

With the advent and rapid development of the transformation optics and metamaterials, invisibility cloaks have captivated much attention in recent years. While most cloaking schemes suffer from limited bandwidth, the carpet cloak, which can hide an object on a reflecting plane, can operate over a broadband frequency range. However, the carpet cloaks experimentally realized thus far still have several limitations. For example, the quasi-conformal mapping carpet cloak leads to a lateral shift of the reflected light ray, while the birefringent carpet cloak only works for a specific polarization. In this work, we propose a conformal transformation scheme to tackle these two problems simultaneously. As an example, we design a mid-infrared carpet cloak in a silicon platform and demonstrate its polarization-insensitive property as well as the minimized lateral shift over a broad frequency band from 24 to 28.3 THz.

Optical color filters are widely applied in many areas including display, imaging, sensing, holography, energy harvest, and measurement. Traditional dye-based color filters have drawbacks such as environmental hazards and instability under high temperature and ultraviolet radiation. With advances in nanotechnology, structural color filters, which are based on the interaction of light with designed nanostructures, are able to overcome the drawbacks. Also, it is possible to fabricate structural color filters using standard complementary metal-oxide-semiconductor (CMOS) fabrication facilities with low cost and high volume. In this work, metasurface-based subtractive color filters (SCFs) are demonstrated on 12-inch (300-mm) glass wafers using a CMOS-compatible fabrication process. In order to make the transmissive-type SCF on a transparent glass wafer, an in-house developed layer transfer process is used to solve the glass wafer handling issue in fabrication tools. Three different heights of embedded silicon nanopillars (110, 170, and 230 nm) are found to support magnetic dipole resonances. With pillar height and pitch variation, SCFs with different displayed colors are achieved. Based on the resonance wavelength, the displayed color of the metasurface is verified within the red-yellow-blue color wheel. The simulation and measurement results are compared and discussed. The work provides an alternative design for high efficiency color filters on a CMOS-compatible platform, and paves the way towards mass-producible large-area metasurfaces.